Effective Schottky barrier height and interface trap density reduction engineering using 2-dimensional reduced graphene oxide interlayer for metal-interlayer-semiconductor contact structure

Sungjoo Song, Seung Hwan Kim, Seung Geun Kim, Kyu Hyun Han, Hyung jun Kim, Hyun Yong Yu*

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    12 Citations (Scopus)

    Fingerprint

    Dive into the research topics of 'Effective Schottky barrier height and interface trap density reduction engineering using 2-dimensional reduced graphene oxide interlayer for metal-interlayer-semiconductor contact structure'. Together they form a unique fingerprint.

    Keyphrases

    Material Science