Effects of Ar pressure on magnetic and magnetocaloric properties of sputtered Er-Co thin films

Miri Kim; Myung Hwa Jung; Chung Man Kim; Sang Ho Lim

doi:10.1016/j.physb.2015.03.028

Effects of Ar pressure on magnetic and magnetocaloric properties of sputtered Er-Co thin films

Miri Kim, Myung Hwa Jung, Chung Man Kim, Sang Ho Lim

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

The magnetic and magnetocaloric properties of Er-Co thin films fabricated by sputtering under an Ar pressure (P_Ar) varying from 2 to 10 mTorr in steps of 2 mTorr are investigated. The content of Co in the sputtered thin films decreases slightly as the P_Ar increases from 2 to 10 mTorr, resulting in a film composition varying from ErCo_1.07 to ErCo_0.93. Extensive changes in the magnetic and magnetocaloric properties are observed. As the P_Ar increases, the compensation temperature increases substantially from 83 to 141 K, as well as the temperature at which the maximum change in the magnetic entropy occurs, particularly in the low P_Ar range. Considering the small change observed in the composition of the thin films as a function of P_Ar, the changes in the magnetic and magnetocaloric properties are extensive, indicating that the P_Ar plays an important role in affecting the aforementioned properties in amorphous magnetic thin films.

Original language	English
Pages (from-to)	175-178
Number of pages	4
Journal	Physica B: Condensed Matter
Volume	476
DOIs	https://doi.org/10.1016/j.physb.2015.03.028
Publication status	Published - 2015 Nov 1

Bibliographical note

Funding Information:
This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) ( NRF-2014M3C1A8048841 ). MK and SHL wish to thank Mr. Seok Jin Yun for his help in the design of the alloys during the initial stage of the work.

Publisher Copyright:
© 2015 Elsevier B.V. All rights reserved.

Keywords

Ar pressure
Er-Co alloys
Magnetic properties
Magnetocaloric effects
Sputtered thin films

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering

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10.1016/j.physb.2015.03.028

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@article{63ccb16918ae46ab9588c216355bd2f1,

title = "Effects of Ar pressure on magnetic and magnetocaloric properties of sputtered Er-Co thin films",

abstract = "The magnetic and magnetocaloric properties of Er-Co thin films fabricated by sputtering under an Ar pressure (PAr) varying from 2 to 10 mTorr in steps of 2 mTorr are investigated. The content of Co in the sputtered thin films decreases slightly as the PAr increases from 2 to 10 mTorr, resulting in a film composition varying from ErCo1.07 to ErCo0.93. Extensive changes in the magnetic and magnetocaloric properties are observed. As the PAr increases, the compensation temperature increases substantially from 83 to 141 K, as well as the temperature at which the maximum change in the magnetic entropy occurs, particularly in the low PAr range. Considering the small change observed in the composition of the thin films as a function of PAr, the changes in the magnetic and magnetocaloric properties are extensive, indicating that the PAr plays an important role in affecting the aforementioned properties in amorphous magnetic thin films.",

keywords = "Ar pressure, Er-Co alloys, Magnetic properties, Magnetocaloric effects, Sputtered thin films",

author = "Miri Kim and Jung, {Myung Hwa} and Kim, {Chung Man} and Lim, {Sang Ho}",

note = "Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) ( NRF-2014M3C1A8048841 ). MK and SHL wish to thank Mr. Seok Jin Yun for his help in the design of the alloys during the initial stage of the work. Publisher Copyright: {\textcopyright} 2015 Elsevier B.V. All rights reserved.",

year = "2015",

month = nov,

day = "1",

doi = "10.1016/j.physb.2015.03.028",

language = "English",

volume = "476",

pages = "175--178",

journal = "Physica B: Condensed Matter",

issn = "0921-4526",

publisher = "Elsevier",

}

TY - JOUR

T1 - Effects of Ar pressure on magnetic and magnetocaloric properties of sputtered Er-Co thin films

AU - Kim, Miri

AU - Jung, Myung Hwa

AU - Kim, Chung Man

AU - Lim, Sang Ho

N1 - Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) ( NRF-2014M3C1A8048841 ). MK and SHL wish to thank Mr. Seok Jin Yun for his help in the design of the alloys during the initial stage of the work. Publisher Copyright: © 2015 Elsevier B.V. All rights reserved.

PY - 2015/11/1

Y1 - 2015/11/1

N2 - The magnetic and magnetocaloric properties of Er-Co thin films fabricated by sputtering under an Ar pressure (PAr) varying from 2 to 10 mTorr in steps of 2 mTorr are investigated. The content of Co in the sputtered thin films decreases slightly as the PAr increases from 2 to 10 mTorr, resulting in a film composition varying from ErCo1.07 to ErCo0.93. Extensive changes in the magnetic and magnetocaloric properties are observed. As the PAr increases, the compensation temperature increases substantially from 83 to 141 K, as well as the temperature at which the maximum change in the magnetic entropy occurs, particularly in the low PAr range. Considering the small change observed in the composition of the thin films as a function of PAr, the changes in the magnetic and magnetocaloric properties are extensive, indicating that the PAr plays an important role in affecting the aforementioned properties in amorphous magnetic thin films.

AB - The magnetic and magnetocaloric properties of Er-Co thin films fabricated by sputtering under an Ar pressure (PAr) varying from 2 to 10 mTorr in steps of 2 mTorr are investigated. The content of Co in the sputtered thin films decreases slightly as the PAr increases from 2 to 10 mTorr, resulting in a film composition varying from ErCo1.07 to ErCo0.93. Extensive changes in the magnetic and magnetocaloric properties are observed. As the PAr increases, the compensation temperature increases substantially from 83 to 141 K, as well as the temperature at which the maximum change in the magnetic entropy occurs, particularly in the low PAr range. Considering the small change observed in the composition of the thin films as a function of PAr, the changes in the magnetic and magnetocaloric properties are extensive, indicating that the PAr plays an important role in affecting the aforementioned properties in amorphous magnetic thin films.

KW - Ar pressure

KW - Er-Co alloys

KW - Magnetic properties

KW - Magnetocaloric effects

KW - Sputtered thin films

UR - http://www.scopus.com/inward/record.url?scp=84943581684&partnerID=8YFLogxK

U2 - 10.1016/j.physb.2015.03.028

DO - 10.1016/j.physb.2015.03.028

M3 - Article

AN - SCOPUS:84943581684

SN - 0921-4526

VL - 476

SP - 175

EP - 178

JO - Physica B: Condensed Matter

JF - Physica B: Condensed Matter

ER -

Effects of Ar pressure on magnetic and magnetocaloric properties of sputtered Er-Co thin films

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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