Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP

A. D. Howard; L. W. Rieth; D. C. Chapman; R. R. Wixom; G. B. Stringfellow; B. J. Kim; T. Y. Seong

doi:10.1063/1.1643783

Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP

A. D. Howard, L. W. Rieth, D. C. Chapman, R. R. Wixom, G. B. Stringfellow, B. J. Kim, T. Y. Seong

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

The effects of addition of CCl ₄ and CBr ₄ during organometallic vapor phase epitaxy (OMPVE) of GaInO were investigated. The addition of Br in small concentrations decreased the amount of CuPt ordering via transmission electron diffraction and photoluminescence measurements. Both Cl and Br significantly roughen the surface morphology. The results from atomic force microscopy show that facets formed increased in height and angle to (001) growth surface with increase in surfactant concentration.

Original language	English
Pages (from-to)	2319-2323
Number of pages	5
Journal	Journal of Applied Physics
Volume	95
Issue number	5
DOIs	https://doi.org/10.1063/1.1643783
Publication status	Published - 2004 Mar 1
Externally published	Yes

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Copyright 2012 Elsevier B.V., All rights reserved.

ASJC Scopus subject areas

General Physics and Astronomy

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abstract = "The effects of addition of CCl 4 and CBr 4 during organometallic vapor phase epitaxy (OMPVE) of GaInO were investigated. The addition of Br in small concentrations decreased the amount of CuPt ordering via transmission electron diffraction and photoluminescence measurements. Both Cl and Br significantly roughen the surface morphology. The results from atomic force microscopy show that facets formed increased in height and angle to (001) growth surface with increase in surfactant concentration.",

author = "Howard, {A. D.} and Rieth, {L. W.} and Chapman, {D. C.} and Wixom, {R. R.} and Stringfellow, {G. B.} and Kim, {B. J.} and Seong, {T. Y.}",

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AU - Howard, A. D.

AU - Rieth, L. W.

AU - Chapman, D. C.

AU - Wixom, R. R.

AU - Stringfellow, G. B.

AU - Kim, B. J.

AU - Seong, T. Y.

PY - 2004/3/1

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AB - The effects of addition of CCl 4 and CBr 4 during organometallic vapor phase epitaxy (OMPVE) of GaInO were investigated. The addition of Br in small concentrations decreased the amount of CuPt ordering via transmission electron diffraction and photoluminescence measurements. Both Cl and Br significantly roughen the surface morphology. The results from atomic force microscopy show that facets formed increased in height and angle to (001) growth surface with increase in surfactant concentration.

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Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP

Abstract

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