Effects of e-beam parameters on sub-micron ferroelectric domain engineering in liquid phase epitaxy LiNbO3 by direct-write e-beam

  • Ji Won Son*
  • , Yin Yuen
  • , Sergei S. Orlov
  • , Lambertus Hesselink
  • *Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

6 Citations (Scopus)

Abstract

By using the direct-write e-beam technique with liquid phase epitaxy LiNbO3 thin films, we have successfully produced sub-micron domain structures for achieving dynamically switchable filters in a periodically poled lithium niobate (PPLN) waveguide. The effects of direct-write e-beam parameters are investigated to achieve sub-micron periodic domain structures in homoepitaxial liquid phase epitaxy (LPE) LiNbO3 thin films. More regular structures appear at acceleration voltages higher than 20 kV and areal dose range 350 μC/cm2 - 450 μC/cm2 with lower scanning speeds. Under these optimal conditions, an approximately 500 μm-long grating of a 1.1 μm period, consisting ∼180 nm domains is achieved.

Original languageEnglish
Pages (from-to)756-761
Number of pages6
JournalOSA Trends in Optics and Photonics Series
Volume99
Publication statusPublished - 2005
Externally publishedYes
Event10th International Conference on Photorefractive, Effects, Materials, and Devices - Hainan, China
Duration: 2005 Jul 192005 Jul 23

ASJC Scopus subject areas

  • General Engineering

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