Effects of HfO2 addition on the plasma resistance of Y2O3 thin films deposited by e-beam PVD

Kang Bin Bae, Hae Seong Jang, Yoon Suk Oh, In Hwan Lee, Sung Min Lee

Research output: Contribution to journalArticlepeer-review

Abstract

Ceramic Y2O3 thin films are often used to coat the inner walls of etching equipment during semiconductor manufacturing to protect them from bombardment by high-energy plasma ions, which can degrade the equipment and cause semiconductor contamination. In this study, the effects of HfO2 addition to the Y2O3 thin film on the plasma resistance were investigated. Thin films were fabricated using electron beam-physical vapor deposition. The addition of HfO2 maintained the cubic Y2O3 crystalline structure while substantially improving the etch resistance during fluorine-based plasma etching. X-ray photoelectron spectroscopy analysis of the etched surface showed that HfO2 addition resulted in a lower F/(O + F) ratio, thus promoting the formation of more Y–O bonds that are more resistant to physical sputtering. Additionally, the analysis indicated that Hf4+ was more likely to be removed from the etched surface than Hfx+ (x < 4). This novel strategy is expected to aid in the development of improved plasma-resistant ceramic materials.

Original languageEnglish
Article number158359
JournalApplied Surface Science
Volume640
DOIs
Publication statusPublished - 2023 Dec 15

Bibliographical note

Funding Information:
This work was supported by Samsung Electronics Co. Ltd. in Korea and in part by the National Research Foundation of Korea (NRF) [NRF-2020M3H4 A3106001]

Funding Information:
This work was supported by Samsung Electronics Co., Ltd. in Korea and in part by the National Research Foundation of Korea (NRF) [ NRF-2020M3H4 A3106001 ]

Publisher Copyright:
© 2023 Elsevier B.V.

Keywords

  • Ceramics
  • Physical Vapor Deposition
  • Plasma Resistance
  • Surface Reaction
  • Thin Film

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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