Keyphrases
Electrical Properties
100%
Structural Properties
100%
Nickel Silicide
100%
Hydrogen Implantation
100%
Grain Size
50%
NiSi
50%
Ni Film
50%
Transmission Electron Microscopy
25%
Hydrogen Ion
25%
X Ray Diffraction
25%
Si Substrate
25%
Nickel Oxide
25%
Electron Beam
25%
X-ray Photoemission Spectroscopy
25%
Temperature Range
25%
Oxide Layer
25%
Rapid Thermal Annealing
25%
Annealing Temperature
25%
Nitrogen Atmosphere
25%
NiSi2
25%
Low Sheet Resistance
25%
Plasma Immersion Ion Implantation
25%
Interface Morphology
25%
Nickel Silicidation
25%
Physics
Grain Size
100%
Electrical Property
100%
X Ray Diffraction
50%
Photoelectric Emission
50%
Electron Beam
50%
Transmission Electron Microscopy
50%
Ion Implantation
50%
Blood Plasma
50%
Material Science
Film
100%
Silicide
100%
Grain Size
66%
Oxide Compound
33%
Transmission Electron Microscopy
33%
X-Ray Photoelectron Spectroscopy
33%
Annealing
33%
X-Ray Diffraction
33%
Ion Implantation
33%
Surface (Surface Science)
33%
Engineering
Implanted Sample
100%
Energy Engineering
25%
Sheet Resistance
25%
Ray Diffraction
25%
Si Substrate
25%
Photoemission
25%
Oxide Layer
25%
Rapid Thermal Annealing
25%
Annealing Temperature
25%
Si Interface
25%
Temperature Range
25%
Ion Implantation
25%