Effects of photoelectrochemical etching of n-polar and Ga-polar gallium nitride on sapphire substrates

Younghun Jung, Kwang Hyeon Baik, Fan Ren, Stephen J. Pearton, Jihyun Kim

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    44 Citations (Scopus)

    Abstract

    We studied the effects of photo electrochemical (PEC) etching by using various concentrations (1, 2, and 4 M) of KOH solutions on both Ga- and N-face GaN layers on sapphire substrates. The Ga-face was chemically stable for KOH solutions, while by sharp contrast the KOH could etch the N-face, where the 6-fold symmetry was observed after the PEC etching. Surface texturing of GaN-based light emitting diodes and solar cells by KOH-based PEC etch could enhance the efficiency of GaN-based photonic devices by increasing the number of the scattering events and randomly changing the angles of the light.

    Original languageEnglish
    Pages (from-to)H676-H678
    JournalJournal of the Electrochemical Society
    Volume157
    Issue number6
    DOIs
    Publication statusPublished - 2010

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Renewable Energy, Sustainability and the Environment
    • Condensed Matter Physics
    • Surfaces, Coatings and Films
    • Electrochemistry
    • Materials Chemistry

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