Fingerprint
Dive into the research topics of 'Effects of surfactant concentration on step height reduction of SiO 2 in chemical mechanical polishing with ceria slurry'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Effects of surfactant concentration on step height reduction of SiO 2 in chemical mechanical polishing with ceria slurry
B. J. Cho, Y. M. Lee, D. H. Shin, D. S. Lim, J. H. Shin, J. Y. Park, Y. S. Choi
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
2
Citations
(Scopus)