Abstract
We have investigated Ag(200 nm)/AgAl(100 nm) ohmic contacts to p-type GaN for near-UV (405 nm) flip-chip light-emitting diodes (LEDs). It is shown that the use of an AgAl alloy capping layer (with 8 at% Al) results in better electrical and optical properties as compared to single Ag contacts when annealed at 430 °C. For example, Ag/AgAl (8 at% Al) contacts give specific contact resistance of 4.6×10-4 Ω cm2 and reflectance of 90% at a wavelength of 405 nm. However, use of an AgAl (with 50 at% Al) layer is not effective. LEDs fabricated with the Ag/AgAl (8 at% Al) reflectors produce higher light output as compared with the ones with single Ag reflectors. Ohmic mechanisms of the Ag/AgAl (8 at% Al) contacts are described and discussed.
Original language | English |
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Pages (from-to) | 14-18 |
Number of pages | 5 |
Journal | Materials Science in Semiconductor Processing |
Volume | 10 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2007 Feb |
Bibliographical note
Funding Information:This work was supported by the basic research program of the Korea Science & Engineering Foundation (Grant no. R01-2006-000-10904-0).
Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.
Keywords
- Ag reflector
- AgAl capping layer
- GaN-based flip-chip LEDs
- Ohmic contacts
- Thermal stability
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering