Keyphrases
Electrical Characterization
100%
Gate Oxide
100%
Scandium Oxide
100%
Metal Oxide Semiconductor
100%
Semiconductor Diodes
100%
Ohmic
40%
N-GaN
40%
Interface Traps
40%
Phosphorylated tau
40%
Terman Method
40%
Metal-organic Chemical Vapor Deposition (MOCVD)
20%
Elevated Temperature
20%
GaN Layers
20%
Electron Beam
20%
TiAl
20%
Molecular Beam Epitaxy
20%
Metallization
20%
Oxygen Plasma
20%
Electron Cyclotron Resonance
20%
Inductively Coupled Plasma
20%
Metal Deposition
20%
Voltage Measurement
20%
Deep State
20%
Conductance-voltage
20%
Plasma System
20%
Capacitance Measurement
20%
Material Science
Oxide Compound
100%
Density
100%
Oxide Semiconductor
100%
Metal Oxide
100%
Molecular Beam Epitaxy
50%
Metal Deposition
50%
Scandium
50%
Capacitance Measurement
50%
Engineering
Capacitance Measurement
50%