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Emission enhancement from nonpolar a-plane III-nitride nanopillar
Byung Jae Kim
*
, Younghun Jung
, Michael A. Mastro
, Jennifer Hite
, Neeraj Nepal
, Charles R. Eddy
, Jihyun Kim
*
Corresponding author for this work
Research output
:
Contribution to journal
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Article
›
peer-review
4
Citations (Scopus)
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Keyphrases
Nanopillars
100%
A-plane
100%
Inductively Coupled Plasma
100%
III-nitrides
100%
Emission Enhancement
100%
Plasma Etching
75%
Photoluminescence Intensity
50%
Nanosphere Lithography
50%
A-plane GaN
50%
GaN-based Light-emitting Diodes
25%
Low Energy
25%
Light Extraction Efficiency
25%
Nitrogen-polar (N-polar)
25%
P-type
25%
Highly Effective
25%
Waveguide
25%
Etching Process
25%
Wavelength Shift
25%
Light Emitters
25%
SiO2 Nanospheres
25%
Inductively Coupled Plasma Etching
25%
Nonpolar GaN
25%
Via Formation
25%
Growth Axis
25%
Photoelectrochemical
25%
Peak Emissions
25%
Photoelectrochemical Etching
25%
Light-emitting Structure
25%
Radiative Transition
25%
Material Science
Lithography
100%
Photoluminescence
100%
Nitride Compound
100%
Nanosphere
100%
Thin Films
50%
Light-Emitting Diode
50%