In this study, organic light-emitting diodes with enhanced out- coupling efficiency were demonstrated by inserting nano-sized pixel defining layer (nPDL). Photoresist is used for composing the nPDL through a laser inteference lithogrphy (LIL) process. The nPDL increases optical efficiency by the Bragg’s diffraction from periodic structures of photonic crystal and the corrugated metallic mirror.
|Number of pages||3|
|Journal||Digest of Technical Papers - SID International Symposium|
|Publication status||Published - 2017|
|Event||SID Symposium, Seminar, and Exhibition 2017, Display Week 2017 - Los Angeles, United States|
Duration: 2017 May 21 → 2017 May 26
Bibliographical notePublisher Copyright:
© 2017 SID.
- Bragg’s diffraction
- Laser interference lithography (LIL)
- Nano-sized pattern
- Organic light-emitting diodes (OLEDs)
- Pixel defining layer (PDL)
ASJC Scopus subject areas