@inproceedings{9a201e14a03046af936db8d010cd5ab8,
title = "Enhancement of reconstructed image by noise reduction for mask inspection of EUVL (Extreme ultra-violet light) lithography",
abstract = "In mask inspection of extreme ultra-violet lithography, defect sizes and locations are critical factors on semiconductor production. This paper addresses a simulated solution of phase retrieval method to reduce a fine dust suspended in the air or on the CCD surface. To reduce such noise, we introduce an image enhancement method. Experimental result shows the contaminated materials such as fine dust can be reduced by the suggested method.",
keywords = "dust, image enhancement, noise reduction, phase retrieval",
author = "Jo, {Jung Geun} and Park, {Min Chul} and Ju, {Byeong Kwon} and Sungjin Cho and Jhon, {Young Min} and Son, {Jung Young}",
year = "2013",
doi = "10.1109/WIO.2013.6601262",
language = "English",
isbn = "9781479907687",
series = "WIO 2013 - 12th Workshop on Information Optics, Proceedings",
booktitle = "WIO 2013 - 12th Workshop on Information Optics, Proceedings",
note = "2013 12th Workshop on Information Optics, WIO 2013 ; Conference date: 15-07-2013 Through 19-07-2013",
}