Epitaxial growth of Cr₂O₃ thin film on Al ₂O₃ (0001) substrate by radio frequency magnetron sputtering combined with rapid-thermal annealing

Engineering & Materials Science

• Rapid thermal annealing 100%
• Epitaxial growth 91%
• Magnetron sputtering 86%
• X ray diffraction 63%
• Thin films 61%
• X ray spectroscopy 55%
• Photoelectron spectroscopy 55%
• Oxygen 52%
• Substrates 45%
• Crystallinity 39%
• Gases 37%
• Annealing 32%
• Flow of gases 31%
• Aluminum oxide 31%
• Surface roughness 26%
• Temperature 26%
• Scanning 25%

Chemical Compounds

• Rapid Thermal Annealing 96%
• Epitaxial Growth 79%
• Magnetron Sputtering 75%
• X-Ray Photoemission 42%
• Flow 42%
• Ambient Reaction Temperature 36%
• Gas 34%
• X-Ray Diffraction 32%
• Photoelectron Spectroscopy 32%
• Annealing 25%
• Crystallinity 24%
• Surface 10%

Physics & Astronomy

• radio frequencies 55%
• magnetron sputtering 54%
• annealing 39%
• thin films 33%
• x rays 29%
• oxygen 26%
• room temperature 24%
• diffraction 23%
• gases 22%
• gas flow 19%
• crystallinity 19%
• photoelectric emission 18%
• roughness 17%
• scanning 13%
• causes 13%
• spectroscopy 11%