Erratum: Effect of imprinting pressure on residual layer thickness in UV nano-imprint lithography (Journal of Vacuum Science and Technology B (2005) 23 (1102))

Heon Lee

doi:10.1116/1.2013316

Erratum: Effect of imprinting pressure on residual layer thickness in UV nano-imprint lithography (Journal of Vacuum Science and Technology B (2005) 23 (1102))

Department of Materials Science and Engineering

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English
Pages (from-to)	2176
Number of pages	1
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	23
Issue number	5
DOIs	https://doi.org/10.1116/1.2013316
Publication status	Published - 2005

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.2013316

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Erratum: Effect of imprinting pressure on residual layer thickness in UV nano-imprint lithography (Journal of Vacuum Science and Technology B (2005) 23 (1102)). / Lee, Heon.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 5, 2005, p. 2176.

Research output: Contribution to journal › Comment/debate › peer-review

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Erratum: Effect of imprinting pressure on residual layer thickness in UV nano-imprint lithography (Journal of Vacuum Science and Technology B (2005) 23 (1102))

ASJC Scopus subject areas

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