Erratum: Effect of imprinting pressure on residual layer thickness in UV nano-imprint lithography (Journal of Vacuum Science and Technology B (2005) 23 (1102))

    Research output: Contribution to journalComment/debatepeer-review

    Original languageEnglish
    Pages (from-to)2176
    Number of pages1
    JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
    Volume23
    Issue number5
    DOIs
    Publication statusPublished - 2005

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Electrical and Electronic Engineering

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