Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

Hyung Seok Park; Ho Hyun Shin; Man Young Sung; Woo Beom Choi; Seung Woo Choi; Sang Yong Park

doi:10.1143/JJAP.51.079206

Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

Hyung Seok Park, Ho Hyun Shin, Man Young Sung, Woo Beom Choi, Seung Woo Choi, Sang Yong Park

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English
Article number	079206
Journal	Japanese journal of applied physics
Volume	51
Issue number	7 PART 1
DOIs	https://doi.org/10.1143/JJAP.51.079206
Publication status	Published - 2012 Jul

ASJC Scopus subject areas

General Engineering
General Physics and Astronomy

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10.1143/JJAP.51.079206

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title = "Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))",

author = "Park, {Hyung Seok} and Shin, {Ho Hyun} and Sung, {Man Young} and Choi, {Woo Beom} and Choi, {Seung Woo} and Park, {Sang Yong}",

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language = "English",

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journal = "Japanese journal of applied physics",

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T2 - Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

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AU - Sung, Man Young

AU - Choi, Woo Beom

AU - Choi, Seung Woo

AU - Park, Sang Yong

PY - 2012/7

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DO - 10.1143/JJAP.51.079206

M3 - Comment/debate

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SN - 0021-4922

VL - 51

JO - Japanese journal of applied physics

JF - Japanese journal of applied physics

IS - 7 PART 1

M1 - 079206

ER -

Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

ASJC Scopus subject areas

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