Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

Hyung Seok Park; Ho Hyun Shin; Man Young Sung; Woo Beom Choi; Seung Woo Choi; Sang Yong Park

doi:10.1143/JJAP.51.079206

Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

Hyung Seok Park^*
, Ho Hyun Shin
, Man Young Sung
, Woo Beom Choi
, Seung Woo Choi
, Sang Yong Park

^*Corresponding author for this work

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English
Article number	079206
Journal	Japanese journal of applied physics
Volume	51
Issue number	7 PART 1
DOIs	https://doi.org/10.1143/JJAP.51.079206
Publication status	Published - 2012 Jul

ASJC Scopus subject areas

General Engineering
General Physics and Astronomy

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10.1143/JJAP.51.079206

Cite this

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title = "Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))",

author = "Park, \{Hyung Seok\} and Shin, \{Ho Hyun\} and Sung, \{Man Young\} and Choi, \{Woo Beom\} and Choi, \{Seung Woo\} and Park, \{Sang Yong\}",

year = "2012",

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doi = "10.1143/JJAP.51.079206",

language = "English",

volume = "51",

journal = "Japanese journal of applied physics",

issn = "0021-4922",

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T2 - Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

AU - Park, Hyung Seok

AU - Shin, Ho Hyun

AU - Sung, Man Young

AU - Choi, Woo Beom

AU - Choi, Seung Woo

AU - Park, Sang Yong

PY - 2012/7

Y1 - 2012/7

UR - https://www.scopus.com/pages/publications/84863794057

U2 - 10.1143/JJAP.51.079206

DO - 10.1143/JJAP.51.079206

M3 - Comment/debate

AN - SCOPUS:84863794057

SN - 0021-4922

VL - 51

JO - Japanese journal of applied physics

JF - Japanese journal of applied physics

IS - 7 PART 1

M1 - 079206

ER -

Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

ASJC Scopus subject areas

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