Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

Hyung Seok Park*, Ho Hyun Shin, Man Young Sung, Woo Beom Choi, Seung Woo Choi, Sang Yong Park

*Corresponding author for this work

    Research output: Contribution to journal › Comment/debate › peer-review

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