Etching characteristics of Ba(Mg1/3Ta2/3)O3 film by using Cl2/SF6 electron cyclotron resonance plasma

Kwang Ho Kwon, Seung Youl Kang, Sang Kyun Lee, Sung Ihl Kim, Nam Kwan Hong, Sahn Nahm, Young Sik Kim

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6 Citations (Scopus)

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Engineering & Materials Science

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