Exact locating of sub-surface microelectronic structures using scanning thermal wave microscopy

Jaehun Chung, Kyeongtae Kim, Gwangseok Hwang, Ohmyoung Kwon, Joon Sik Lee, Seungho Park, Young Ki Choi

Research output: Contribution to journalConference articlepeer-review


With the fast advance of ultra large scale integrated (ULSI) circuit technology, the need for sub-surface imaging technique to locate and characterize sub-surface defects in ULSI circuits has been growing. In this study we advance scanning thermal wave microscopy further so that the absolute phase lag of the thermal waves generated by an electrically heated sub-surface microelectronic structure buried in an ULSI circuit can be measured. The measurement of the absolute phase lag allowed exact locating of the vertical and horizontal position of buried microelectronic structures and evaluation of their soundness nondestructively.

Original languageEnglish
Article number72681V
JournalProceedings of SPIE - The International Society for Optical Engineering
Publication statusPublished - 2008
EventSmart Structures, Devices, and Systems IV - Melbourne, VIC, Australia
Duration: 2008 Dec 102008 Dec 12


  • Non-destructive evaluation (NDE)
  • Phase lag
  • Scanning thermal microscopy (SThM)
  • Scanning thermal wave microscopy (STWM)
  • Thermal wave

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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