Abstract
We investigated impact of excimer laser annealing on the AlGaN/GaN heterojunction structures, where the 2-dimensional electron gas (2DEG) is formed. When applying homogeneous laser pulses at various laser densities, the electrical resistance of the 2DEG shows sudden increase along with sharp decrease of the carrier mobility and slight decrease of the carrier density. Especially, when applying laser density of 300 mJ/cm2, we could obtain such jump of electrical resistance even after 2 min, i.e. 2400 pulses at 20 Hz. Low temperature photoluminescence and x-ray photoemission spectroscopy measurements show that the excimer laser annealing suppresses the coherent charge carriers and oxides the sample surface to form Ga2O. We estimate the activation energy of suppressing 2DEG to be 0.89 eV for the ELA process. We suggest that the excimer laser annealing has potential for gate oxide fabrication, surface passivation, and lateral pattering of 2DEG structures.
Original language | English |
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Pages (from-to) | 628-632 |
Number of pages | 5 |
Journal | Current Applied Physics |
Volume | 16 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2016 Jun 1 |
Bibliographical note
Funding Information:This work was supported by the 2014 Research Fund of the University of Seoul for Young Jun Chang. Also, this work was supported by the National Research Foundation of Korea (NRF) Grant No. NRF-2015M2B2A4033010 for In Hak Lee and Hyuk Jin Kim, and NRF-2012M2B2A4029470 for Beom Soo Joo and Moonsup Han. PLS-II was supported in part by the Ministry of Science, ICT and Future Planning and Pohang University of Science and Technology .
Publisher Copyright:
© 2016 Elsevier B.V. All rights reserved.
Copyright:
Copyright 2017 Elsevier B.V., All rights reserved.
Keywords
- GaN
- Hall measurement
- Laser annealing
- PL
- XPS
ASJC Scopus subject areas
- General Materials Science
- General Physics and Astronomy