Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design

Hyung Youl Park, Woo Shik Jung, Dong Ho Kang, Jaeho Jeon, Gwangwe Yoo, Yongkook Park, Jinhee Lee, Yun Hee Jang, Jaeho Lee, Seongjun Park, Hyun Yong Yu, Byungha Shin, Sungjoo Lee, Jin Hong Park

Research output: Contribution to journalArticlepeer-review

68 Citations (Scopus)
Original languageEnglish
Pages (from-to)864-870
Number of pages7
JournalAdvanced Materials
Issue number5
Publication statusPublished - 2016 Feb

Bibliographical note

Funding Information:
This work was supported by the National Research Foundation of Korea (NRF) funded by the Korea Government (MSIP) (Grant No. 2015R1A2A2A01002965).


  • contact resistance
  • doping
  • edge contact
  • graphene
  • optoelectronic devices

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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