Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design

Hyung Youl Park; Woo Shik Jung; Dong Ho Kang; Jaeho Jeon; Gwangwe Yoo; Yongkook Park; Jinhee Lee; Yun Hee Jang; Jaeho Lee; Seongjun Park; Hyun Yong Yu; Byungha Shin; Sungjoo Lee; Jin Hong Park

doi:10.1002/adma.201503715

Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design

Hyung Youl Park, Woo Shik Jung, Dong Ho Kang, Jaeho Jeon, Gwangwe Yoo, Yongkook Park, Jinhee Lee, Yun Hee Jang, Jaeho Lee, Seongjun Park, Hyun Yong Yu, Byungha Shin, Sungjoo Lee, Jin Hong Park

Research output: Contribution to journal › Article › peer-review

77 Citations (Scopus)

Original language	English
Pages (from-to)	864-870
Number of pages	7
Journal	Advanced Materials
Volume	28
Issue number	5
DOIs	https://doi.org/10.1002/adma.201503715
Publication status	Published - 2016 Feb

Bibliographical note

Funding Information:
This work was supported by the National Research Foundation of Korea (NRF) funded by the Korea Government (MSIP) (Grant No. 2015R1A2A2A01002965).

Keywords

contact resistance
doping
edge contact
graphene
optoelectronic devices

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

Access to Document

10.1002/adma.201503715

Cite this

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title = "Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design",

keywords = "contact resistance, doping, edge contact, graphene, optoelectronic devices",

author = "Park, {Hyung Youl} and Jung, {Woo Shik} and Kang, {Dong Ho} and Jaeho Jeon and Gwangwe Yoo and Yongkook Park and Jinhee Lee and Jang, {Yun Hee} and Jaeho Lee and Seongjun Park and Yu, {Hyun Yong} and Byungha Shin and Sungjoo Lee and Park, {Jin Hong}",

note = "Funding Information: This work was supported by the National Research Foundation of Korea (NRF) funded by the Korea Government (MSIP) (Grant No. 2015R1A2A2A01002965).",

year = "2016",

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doi = "10.1002/adma.201503715",

language = "English",

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AU - Park, Hyung Youl

AU - Jung, Woo Shik

AU - Kang, Dong Ho

AU - Jeon, Jaeho

AU - Yoo, Gwangwe

AU - Park, Yongkook

AU - Lee, Jinhee

AU - Jang, Yun Hee

AU - Lee, Jaeho

AU - Park, Seongjun

AU - Yu, Hyun Yong

AU - Shin, Byungha

AU - Lee, Sungjoo

AU - Park, Jin Hong

N1 - Funding Information: This work was supported by the National Research Foundation of Korea (NRF) funded by the Korea Government (MSIP) (Grant No. 2015R1A2A2A01002965).

PY - 2016/2

Y1 - 2016/2

KW - contact resistance

KW - doping

KW - edge contact

KW - graphene

KW - optoelectronic devices

UR - http://www.scopus.com/inward/record.url?scp=84956741828&partnerID=8YFLogxK

U2 - 10.1002/adma.201503715

DO - 10.1002/adma.201503715

M3 - Article

AN - SCOPUS:84956741828

SN - 0935-9648

VL - 28

SP - 864

EP - 870

JO - Advanced Materials

JF - Advanced Materials

IS - 5

ER -

Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

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