Fabrication and structural analysis of an epitaixal Ni/Cu(001) nanostructure on a Si substrate

S. G. Lee, S. W. Shin, J. Lee, J. H. Lee, J. H. Song, J. Y. Choi, H. H. Lee, H. S. Lee

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

An epitaxial Ni(4.5 nm - 100 nm)/Cu nanostructure has been fabricated on a Si(001) substrate by using nanoporous anodic aluminum oxide (AAO) as a mask during evaporation. Both the nanosized Cu and Ni layers have (001) surfaces with a Ni 〈110 〉 // Cu 〈 110 〉 // Si 〈 001 〉 in-plane relation. The Ni nanostructure is found to be less strained than the film at the same Ni thickness, which plays a crucial role in determining the magnetic anisotropy of the nanostructure. Combining a self-assembled AAO mask with a conventional evaporation method can be a potential technique, instead of traditional lithography, for the growth of various epitaxial metal nanostructures.

Original languageEnglish
Pages (from-to)178-182
Number of pages5
JournalJournal of the Korean Physical Society
Volume51
Issue number1
DOIs
Publication statusPublished - 2007 Jul

Keywords

  • AAO
  • Epitaxial Ni/Cu
  • Magnetic anisotropy
  • Nnanostructure
  • Strain

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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