Abstract
An epitaxial Ni(4.5 nm - 100 nm)/Cu nanostructure has been fabricated on a Si(001) substrate by using nanoporous anodic aluminum oxide (AAO) as a mask during evaporation. Both the nanosized Cu and Ni layers have (001) surfaces with a Ni 〈110 〉 // Cu 〈 110 〉 // Si 〈 001 〉 in-plane relation. The Ni nanostructure is found to be less strained than the film at the same Ni thickness, which plays a crucial role in determining the magnetic anisotropy of the nanostructure. Combining a self-assembled AAO mask with a conventional evaporation method can be a potential technique, instead of traditional lithography, for the growth of various epitaxial metal nanostructures.
Original language | English |
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Pages (from-to) | 178-182 |
Number of pages | 5 |
Journal | Journal of the Korean Physical Society |
Volume | 51 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2007 Jul |
Keywords
- AAO
- Epitaxial Ni/Cu
- Magnetic anisotropy
- Nnanostructure
- Strain
ASJC Scopus subject areas
- Physics and Astronomy(all)