Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process

Sung Hoon Hong; Jong Hwa Lee; Heon Lee

doi:10.1016/j.mee.2007.01.101

Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process

Sung Hoon Hong, Jong Hwa Lee, Heon Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

40 Citations (Scopus)

Abstract

Fabrication of imprint stamp is a key issue of nanoimprint lithography. In this study, we attempt to fabricate the nickel imprint stamp using hot embossing lithography and electroforming processes. As small as 50 nm sized patterns of original silicon master were faithfully transferred to polyvinyl chloride (PVC) film. By electroforming on hot embossed PVC film, nickel stamp, which has the same patterns of original silicon master stamp, was successfully fabricated.

Original language	English
Pages (from-to)	977-979
Number of pages	3
Journal	Microelectronic Engineering
Volume	84
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2007.01.101
Publication status	Published - 2007 May

Bibliographical note

Funding Information:
This research was supported by a Grant (M102KN01001) from the center for Nano-scale Mechatronics and Manufacturing, one of the 21st century Frontier Research Programs supported by the Ministry of Science and Technology of Korea.

Keywords

Hot embossing
Nanoimprint lithography
Nickel stamp

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

Access to Document

10.1016/j.mee.2007.01.101

Cite this

@article{fc2dbfb4d90744c189742770f438f011,

title = "Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process",

abstract = "Fabrication of imprint stamp is a key issue of nanoimprint lithography. In this study, we attempt to fabricate the nickel imprint stamp using hot embossing lithography and electroforming processes. As small as 50 nm sized patterns of original silicon master were faithfully transferred to polyvinyl chloride (PVC) film. By electroforming on hot embossed PVC film, nickel stamp, which has the same patterns of original silicon master stamp, was successfully fabricated.",

keywords = "Hot embossing, Nanoimprint lithography, Nickel stamp",

author = "Hong, {Sung Hoon} and Lee, {Jong Hwa} and Heon Lee",

note = "Funding Information: This research was supported by a Grant (M102KN01001) from the center for Nano-scale Mechatronics and Manufacturing, one of the 21st century Frontier Research Programs supported by the Ministry of Science and Technology of Korea.",

year = "2007",

month = may,

doi = "10.1016/j.mee.2007.01.101",

language = "English",

volume = "84",

pages = "977--979",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "5-8",

}

TY - JOUR

T1 - Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process

AU - Hong, Sung Hoon

AU - Lee, Jong Hwa

AU - Lee, Heon

N1 - Funding Information: This research was supported by a Grant (M102KN01001) from the center for Nano-scale Mechatronics and Manufacturing, one of the 21st century Frontier Research Programs supported by the Ministry of Science and Technology of Korea.

PY - 2007/5

Y1 - 2007/5

N2 - Fabrication of imprint stamp is a key issue of nanoimprint lithography. In this study, we attempt to fabricate the nickel imprint stamp using hot embossing lithography and electroforming processes. As small as 50 nm sized patterns of original silicon master were faithfully transferred to polyvinyl chloride (PVC) film. By electroforming on hot embossed PVC film, nickel stamp, which has the same patterns of original silicon master stamp, was successfully fabricated.

AB - Fabrication of imprint stamp is a key issue of nanoimprint lithography. In this study, we attempt to fabricate the nickel imprint stamp using hot embossing lithography and electroforming processes. As small as 50 nm sized patterns of original silicon master were faithfully transferred to polyvinyl chloride (PVC) film. By electroforming on hot embossed PVC film, nickel stamp, which has the same patterns of original silicon master stamp, was successfully fabricated.

KW - Hot embossing

KW - Nanoimprint lithography

KW - Nickel stamp

UR - http://www.scopus.com/inward/record.url?scp=34247620822&partnerID=8YFLogxK

U2 - 10.1016/j.mee.2007.01.101

DO - 10.1016/j.mee.2007.01.101

M3 - Article

AN - SCOPUS:34247620822

SN - 0167-9317

VL - 84

SP - 977

EP - 979

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

ER -

Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this