Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process

Sung Hoon Hong, Jong Hwa Lee, Heon Lee

Research output: Contribution to journalArticlepeer-review

40 Citations (Scopus)


Fabrication of imprint stamp is a key issue of nanoimprint lithography. In this study, we attempt to fabricate the nickel imprint stamp using hot embossing lithography and electroforming processes. As small as 50 nm sized patterns of original silicon master were faithfully transferred to polyvinyl chloride (PVC) film. By electroforming on hot embossed PVC film, nickel stamp, which has the same patterns of original silicon master stamp, was successfully fabricated.

Original languageEnglish
Pages (from-to)977-979
Number of pages3
JournalMicroelectronic Engineering
Issue number5-8
Publication statusPublished - 2007 May

Bibliographical note

Funding Information:
This research was supported by a Grant (M102KN01001) from the center for Nano-scale Mechatronics and Manufacturing, one of the 21st century Frontier Research Programs supported by the Ministry of Science and Technology of Korea.


  • Hot embossing
  • Nanoimprint lithography
  • Nickel stamp

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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