Fabrication of 70 nm narrow metal nanowire structure on flexible PET film by nanoimprint lithography

Jong Hwa Lee, Ki yeon Yang, Sung Hoon Hong, Heon Lee, Kyung Woo Choi

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)


As a promising substrate for various kinds of devices, polyethylene-terephthalate (PET) film has many advantages in terms of transparency, flexibility, chemical stability, thermal resistance, mechanical strength and low fabrication cost. In order to build actual device structure on PET substrate, micro to nanometer scale patterns of functional material have to be formed. In this work, 70 nm sized resist patterns with near zero residual layer were made on PET film, using nanoimprint lithography process, based on 'partial filling effect'. After brief oxygen plasma treatment and e-beam evaporation of functional materials such as Cr metal, resist patterns were lifted-off with acetone solution and 70 nm sized Cr nanowire structure was uniformly formed on flexible PET substrate.

Original languageEnglish
Pages (from-to)710-713
Number of pages4
JournalMicroelectronic Engineering
Issue number4
Publication statusPublished - 2008 Apr


  • Lift-off
  • Metal nanowire
  • Nanoimprint
  • PET film
  • PMMA
  • Partial filling effect

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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