TY - JOUR
T1 - Fabrication of 70 nm narrow metal nanowire structure on flexible PET film by nanoimprint lithography
AU - Lee, Jong Hwa
AU - Yang, Ki yeon
AU - Hong, Sung Hoon
AU - Lee, Heon
AU - Choi, Kyung Woo
N1 - Funding Information:
This research was supported by a Grant (M102KN01001) from the center for Nanoscale Mechatronics and Manufacturing, one of the 21st century Frontier Research Programs supported by the Ministry of Science and Technology of Korea and the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund) (KRF-2005-003-D00142).
PY - 2008/4
Y1 - 2008/4
N2 - As a promising substrate for various kinds of devices, polyethylene-terephthalate (PET) film has many advantages in terms of transparency, flexibility, chemical stability, thermal resistance, mechanical strength and low fabrication cost. In order to build actual device structure on PET substrate, micro to nanometer scale patterns of functional material have to be formed. In this work, 70 nm sized resist patterns with near zero residual layer were made on PET film, using nanoimprint lithography process, based on 'partial filling effect'. After brief oxygen plasma treatment and e-beam evaporation of functional materials such as Cr metal, resist patterns were lifted-off with acetone solution and 70 nm sized Cr nanowire structure was uniformly formed on flexible PET substrate.
AB - As a promising substrate for various kinds of devices, polyethylene-terephthalate (PET) film has many advantages in terms of transparency, flexibility, chemical stability, thermal resistance, mechanical strength and low fabrication cost. In order to build actual device structure on PET substrate, micro to nanometer scale patterns of functional material have to be formed. In this work, 70 nm sized resist patterns with near zero residual layer were made on PET film, using nanoimprint lithography process, based on 'partial filling effect'. After brief oxygen plasma treatment and e-beam evaporation of functional materials such as Cr metal, resist patterns were lifted-off with acetone solution and 70 nm sized Cr nanowire structure was uniformly formed on flexible PET substrate.
KW - Lift-off
KW - Metal nanowire
KW - Nanoimprint
KW - PET film
KW - PMMA
KW - Partial filling effect
UR - http://www.scopus.com/inward/record.url?scp=40249089780&partnerID=8YFLogxK
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U2 - 10.1016/j.mee.2007.12.058
DO - 10.1016/j.mee.2007.12.058
M3 - Article
AN - SCOPUS:40249089780
SN - 0167-9317
VL - 85
SP - 710
EP - 713
JO - Microelectronic Engineering
JF - Microelectronic Engineering
IS - 4
ER -