Fabrication of 70 nm narrow metal nanowire structure on flexible PET film by nanoimprint lithography

Jong Hwa Lee, Ki yeon Yang, Sung Hoon Hong, Heon Lee, Kyung Woo Choi

    Research output: Contribution to journalArticlepeer-review

    24 Citations (Scopus)

    Abstract

    As a promising substrate for various kinds of devices, polyethylene-terephthalate (PET) film has many advantages in terms of transparency, flexibility, chemical stability, thermal resistance, mechanical strength and low fabrication cost. In order to build actual device structure on PET substrate, micro to nanometer scale patterns of functional material have to be formed. In this work, 70 nm sized resist patterns with near zero residual layer were made on PET film, using nanoimprint lithography process, based on 'partial filling effect'. After brief oxygen plasma treatment and e-beam evaporation of functional materials such as Cr metal, resist patterns were lifted-off with acetone solution and 70 nm sized Cr nanowire structure was uniformly formed on flexible PET substrate.

    Original languageEnglish
    Pages (from-to)710-713
    Number of pages4
    JournalMicroelectronic Engineering
    Volume85
    Issue number4
    DOIs
    Publication statusPublished - 2008 Apr

    Bibliographical note

    Funding Information:
    This research was supported by a Grant (M102KN01001) from the center for Nanoscale Mechatronics and Manufacturing, one of the 21st century Frontier Research Programs supported by the Ministry of Science and Technology of Korea and the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund) (KRF-2005-003-D00142).

    Keywords

    • Lift-off
    • Metal nanowire
    • Nanoimprint
    • PET film
    • PMMA
    • Partial filling effect

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Atomic and Molecular Physics, and Optics
    • Condensed Matter Physics
    • Surfaces, Coatings and Films
    • Electrical and Electronic Engineering

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