Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

Hak Jong Choi; Sang Woo Ryu; Junho Jun; Sungjin Moon; Daihong Huh; Yang Doo Kim; Heon Lee

doi:10.1039/c6ra14565e

Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

Hak Jong Choi, Sang Woo Ryu, Junho Jun, Sungjin Moon, Daihong Huh, Yang Doo Kim, Heon Lee

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq^-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.

Original language	English
Pages (from-to)	81814-81817
Number of pages	4
Journal	RSC Advances
Volume	6
Issue number	85
DOIs	https://doi.org/10.1039/c6ra14565e
Publication status	Published - 2016

Bibliographical note

Funding Information:
This research was supported by the Pioneer Research Center Program through the National Research Foundation of Korea funded by the Ministry of Science, ICT & Future Planning (NRF-2013M3C1A3063597).

Publisher Copyright:
© 2016 The Royal Society of Chemistry.

Copyright:
Copyright 2017 Elsevier B.V., All rights reserved.

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering

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title = "Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process",

abstract = "In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.",

author = "Choi, {Hak Jong} and Ryu, {Sang Woo} and Junho Jun and Sungjin Moon and Daihong Huh and Kim, {Yang Doo} and Heon Lee",

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doi = "10.1039/c6ra14565e",

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T1 - Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

AU - Choi, Hak Jong

AU - Ryu, Sang Woo

AU - Jun, Junho

AU - Moon, Sungjin

AU - Huh, Daihong

AU - Kim, Yang Doo

AU - Lee, Heon

N1 - Funding Information: This research was supported by the Pioneer Research Center Program through the National Research Foundation of Korea funded by the Ministry of Science, ICT & Future Planning (NRF-2013M3C1A3063597). Publisher Copyright: © 2016 The Royal Society of Chemistry. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.

PY - 2016

Y1 - 2016

N2 - In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.

AB - In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.

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Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

Abstract

Bibliographical note

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