Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

Hak Jong Choi; Sang Woo Ryu; Junho Jun; Sungjin Moon; Daihong Huh; Yang Doo Kim; Heon Lee

doi:10.1039/c6ra14565e

Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

Hak Jong Choi, Sang Woo Ryu, Junho Jun, Sungjin Moon, Daihong Huh, Yang Doo Kim, Heon Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq^-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.

Original language	English
Pages (from-to)	81814-81817
Number of pages	4
Journal	RSC Advances
Volume	6
Issue number	85
DOIs	https://doi.org/10.1039/c6ra14565e
Publication status	Published - 2016

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)

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title = "Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process",

abstract = "In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.",

author = "Choi, {Hak Jong} and Ryu, {Sang Woo} and Junho Jun and Sungjin Moon and Daihong Huh and Kim, {Yang Doo} and Heon Lee",

note = "Funding Information: This research was supported by the Pioneer Research Center Program through the National Research Foundation of Korea funded by the Ministry of Science, ICT & Future Planning (NRF-2013M3C1A3063597). Publisher Copyright: {\textcopyright} 2016 The Royal Society of Chemistry. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.",

year = "2016",

doi = "10.1039/c6ra14565e",

language = "English",

volume = "6",

pages = "81814--81817",

journal = "RSC Advances",

issn = "2046-2069",

publisher = "Royal Society of Chemistry",

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T1 - Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

AU - Choi, Hak Jong

AU - Ryu, Sang Woo

AU - Jun, Junho

AU - Moon, Sungjin

AU - Huh, Daihong

AU - Kim, Yang Doo

AU - Lee, Heon

N1 - Funding Information: This research was supported by the Pioneer Research Center Program through the National Research Foundation of Korea funded by the Ministry of Science, ICT & Future Planning (NRF-2013M3C1A3063597). Publisher Copyright: © 2016 The Royal Society of Chemistry. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.

PY - 2016

Y1 - 2016

N2 - In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.

AB - In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.

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ER -

Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

Abstract

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