Abstract
Thin CdS films were fabricated by Langmuir deposition, self-assembly, and dip-pen nanolithography methods. Firstly, LB films of saturated arachidic acid and LS films of unsaturated 10,12-pentacosadiynoic acid were reacted with cadmium ions and exposed to H2S gas. Formation of CdS crystal was observed with Fourier transform infrared (FTIR) spectra and atomic force microscope (AFM). Secondly, mercaptohexadecanoic acid was self-assembled on Au substrate and was reacted with CdS colloidal particles. At pH=9.1, the density of CdS colloids immobilized on Au substrate was very high compared to one at pH=5.0. Finally, thin films of CdS were also prepared on silicon and Au substrates by cadmium chloride-coated AFM tip and successive exposure of H2S gas. Localized formation of CdS crystal was suggested with AFM and depth-profiling Auger electron microscopy (AES).
| Original language | English |
|---|---|
| Pages (from-to) | 697-704 |
| Number of pages | 8 |
| Journal | Korean Journal of Chemical Engineering |
| Volume | 27 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2010 Mar |
Bibliographical note
Funding Information:This work was supported by the Korea Research Foundation (Center for Integrated Nano Systems (KRF-R0406243)), Ministry of Science & Technology (Protein Chip Technology program (MOST-R0608431) and Center for Ultramicrochemical Process System (R11-2001-089-07001)), Ministry of Health and Welfare (MOHA050750), and the Korea Foundation for International Cooperation of Science
Keywords
- CdS
- Dip-pen Nanolithography
- Langmuir-Blodgett Film
- Langmuir-Schafer Film
- Self-assembled Monolayers
ASJC Scopus subject areas
- Chemistry(all)
- Chemical Engineering(all)