Fabrication of complex nanoscale structures on various substrates

Kang Soo Han; Sung Hoon Hong; Heon Lee

doi:10.1063/1.2789735

Fabrication of complex nanoscale structures on various substrates

Kang Soo Han, Sung Hoon Hong, Heon Lee

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Abstract

Polymer based complex nanoscale structures were fabricated and transferred to various substrates using reverse nanoimprint lithography. To facilitate the fabrication and transference of the large area of the nanostructured layer to the substrates, a water-soluble polyvinyl alcohol mold was used. After generation and transference of the nanostructured layer, the polyvinyl alcohol mold was removed by dissolving in water. A residue-free, UV-curable, glue layer was formulated and used to bond the nanostructured layer onto the substrates. As a result, nanometer scale patterned polymer layers were bonded to various substrates and three-dimensional nanostructures were also fabricated by stacking of the layers.

Original language	English
Article number	123118
Journal	Applied Physics Letters
Volume	91
Issue number	12
DOIs	https://doi.org/10.1063/1.2789735
Publication status	Published - 2007

Bibliographical note

Funding Information:
This work was supported by Korea Health 21 R&D Project (Grant No. A050750) from Ministry of Health and Welfare, basic research program from Korea Science and Engineering Foundation (Grant No. R01-2006-000-10904-0), and the Seoul Fellowship.

Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.2789735

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abstract = "Polymer based complex nanoscale structures were fabricated and transferred to various substrates using reverse nanoimprint lithography. To facilitate the fabrication and transference of the large area of the nanostructured layer to the substrates, a water-soluble polyvinyl alcohol mold was used. After generation and transference of the nanostructured layer, the polyvinyl alcohol mold was removed by dissolving in water. A residue-free, UV-curable, glue layer was formulated and used to bond the nanostructured layer onto the substrates. As a result, nanometer scale patterned polymer layers were bonded to various substrates and three-dimensional nanostructures were also fabricated by stacking of the layers.",

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AU - Lee, Heon

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AB - Polymer based complex nanoscale structures were fabricated and transferred to various substrates using reverse nanoimprint lithography. To facilitate the fabrication and transference of the large area of the nanostructured layer to the substrates, a water-soluble polyvinyl alcohol mold was used. After generation and transference of the nanostructured layer, the polyvinyl alcohol mold was removed by dissolving in water. A residue-free, UV-curable, glue layer was formulated and used to bond the nanostructured layer onto the substrates. As a result, nanometer scale patterned polymer layers were bonded to various substrates and three-dimensional nanostructures were also fabricated by stacking of the layers.

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Fabrication of complex nanoscale structures on various substrates

Abstract

Bibliographical note

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