Fabrication of Fe3O4 thin film using reactive DC magnetron sputtering

Minkyung Jung; Sungmin Park; Daewon Park; Seong Rae Lee

Fabrication of Fe₃O₄ thin film using reactive DC magnetron sputtering

Minkyung Jung, Sungmin Park, Daewon Park, Seong Rae Lee

Research output: Contribution to journal › Article › peer-review

Abstract

We investigated the effects of deposition conditions on the fabrication of Fe₃O₄ thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crystallinity were also studied. We have successfully fabricated Fe₃O₄ film with thickness of about 10 nm under optimal reactive sputtering conditions. The saturation magnetization, resistivity, and Verwey transition of the Fe₃O₄ film were 298 emu/cc, 4.0× 10^-2 Ωcm, and 125 K., respectively.

Original language	English
Pages (from-to)	378-382
Number of pages	5
Journal	Journal of Korean Institute of Metals and Materials
Volume	47
Issue number	6
Publication status	Published - 2009 Jun

Keywords

FeO film
Half metallic reactive sputtering

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Modelling and Simulation
Surfaces, Coatings and Films
Metals and Alloys

Cite this

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title = "Fabrication of Fe3O4 thin film using reactive DC magnetron sputtering",

abstract = "We investigated the effects of deposition conditions on the fabrication of Fe3O4 thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crystallinity were also studied. We have successfully fabricated Fe3O4 film with thickness of about 10 nm under optimal reactive sputtering conditions. The saturation magnetization, resistivity, and Verwey transition of the Fe3O4 film were 298 emu/cc, 4.0× 10-2 Ωcm, and 125 K., respectively.",

keywords = "FeO film, Half metallic reactive sputtering",

author = "Minkyung Jung and Sungmin Park and Daewon Park and Lee, {Seong Rae}",

year = "2009",

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language = "English",

volume = "47",

pages = "378--382",

journal = "Journal of Korean Institute of Metals and Materials",

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publisher = "Korean Institute of Metals and Materials",

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T1 - Fabrication of Fe3O4 thin film using reactive DC magnetron sputtering

AU - Jung, Minkyung

AU - Park, Sungmin

AU - Park, Daewon

AU - Lee, Seong Rae

PY - 2009/6

Y1 - 2009/6

N2 - We investigated the effects of deposition conditions on the fabrication of Fe3O4 thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crystallinity were also studied. We have successfully fabricated Fe3O4 film with thickness of about 10 nm under optimal reactive sputtering conditions. The saturation magnetization, resistivity, and Verwey transition of the Fe3O4 film were 298 emu/cc, 4.0× 10-2 Ωcm, and 125 K., respectively.

AB - We investigated the effects of deposition conditions on the fabrication of Fe3O4 thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crystallinity were also studied. We have successfully fabricated Fe3O4 film with thickness of about 10 nm under optimal reactive sputtering conditions. The saturation magnetization, resistivity, and Verwey transition of the Fe3O4 film were 298 emu/cc, 4.0× 10-2 Ωcm, and 125 K., respectively.

KW - FeO film

KW - Half metallic reactive sputtering

UR - http://www.scopus.com/inward/record.url?scp=68249124833&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:68249124833

SN - 1738-8228

VL - 47

SP - 378

EP - 382

JO - Journal of Korean Institute of Metals and Materials

JF - Journal of Korean Institute of Metals and Materials

IS - 6

ER -

Fabrication of Fe₃O₄ thin film using reactive DC magnetron sputtering

Abstract

Keywords

ASJC Scopus subject areas

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