Fabrication of functional nanosized patterns with UV-curable polysilsesquioxane on photovoltaic protective glass substrates using hybrid nano-imprint lithography

Ju Hyeon Shin, Bit Na Go, Hak Jong Choi, Joong Yeon Cho, Albert Sung Soo Lee, Seung Sang Hwang, Hyuk Jin Cha, Heon Lee

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

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Engineering & Materials Science

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