Abstract
Hollow-type microneedle array can be used for painless, continuous and stable drug delivery through a human skin. The needles must be sharp and have sufficient length in order to penetrate the epidermis. An array of hollow-type silicon microneedles was fabricated by using deep reactive ion etching and HNA wet etching with two oxide masks. Isotropic etching was used to create tapered tips of the needles, and anisotropic etching of Bosch process was used to make the extended length and holes of microneedles. The microneedles were formed by three steps of isotropic, anisotropic, and isotropic etching in order. The holes were made by one anisotropic etching step. The fabricated microneedles have 170 μm width, 40 μm hole diameter and 230 μm length.
Original language | English |
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Pages (from-to) | 2221-2224 |
Number of pages | 4 |
Journal | Transactions of the Korean Institute of Electrical Engineers |
Volume | 56 |
Issue number | 12 |
Publication status | Published - 2007 Dec |
Keywords
- Anisotropic etching
- Deep reactive ion etching
- HNA wet etching
- Hollow-type silicon micronedle array
- Isotropic etching
ASJC Scopus subject areas
- Electrical and Electronic Engineering