Fabrication of metal nano dot dry etching mask using block copolymer thin film

Keyphrases

• Dry Etching 100%
• Block Copolymer Thin Films 100%
• Etching Mask 100%
• Metal Nanodot 100%
• Nanodots 66%
• PS Template 66%
• Self-assembling 33%
• Acetic Acid 33%
• Rinsing 33%
• Silicon Substrate 33%
• Lift-off 33%
• Nanosize 33%
• Field Emission Scanning Electron Microscopy (FE-SEM) 33%
• NiAl 33%
• Uniformly Distributed 33%
• Ni-Au 33%
• Atomic Force Microscope 33%
• Reactive Ion Etching 33%
• Si Surface 33%
• Nanotemplate 33%
• Distributed Parallel 33%
• Periodic Array 33%
• Dense Array 33%
• Al Thin Film 33%
• E-beam Evaporator 33%
• Ni Thin Film 33%
• Size Patterns 33%
• Parallel Cylinders 33%

Material Science

• Thin Films 100%
• Dry Etching 100%
• Poly Methyl Methacrylate 100%
• Block Copolymer 100%
• Silicon 50%
• Scanning Electron Microscopy 50%
• Reactive Ion Etching 50%
• Surface (Surface Science) 50%

Engineering

• Thin Films 100%
• Dry Etching 100%
• Atomic Force Microscope 50%
• Evaporator 50%
• Silicon Substrate 50%
• Si Surface 50%
• Field Emission Scanning Electron Microscope 50%