Abstract
Moth-eye structures were produced on a p-GaN top cladding layer by UV imprint and inductively coupled plasma (ICP) etch processes in order to improve the light extraction efficiency of GaN-based green light-emitting diodes (LEDs). The height and shape of moth-eye structures were adjusted by controlling the thickness of Cr mask layer and ICP etching time. The transmittance of LED device stacks with moth-eye structure was increased up to 1.5-2.5 times, compared to identical LED sample without moth-eye structure and the intensity of photoluminescence from the InGaN multi-quantum well layer of LED sample with moth-eye structure was 5-7 times higher than that of the LED sample without the moth-eye structure.
Original language | English |
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Pages (from-to) | 170-173 |
Number of pages | 4 |
Journal | Materials Science and Engineering: B |
Volume | 163 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2009 Jul 25 |
Bibliographical note
Funding Information:This work is the outcome of a Manpower Development Program for Energy & Resources supported by the Ministry of Knowledge and Economy (MKE). This work is also supported by Seoul R&BD Program (NT080570M0211611).
Keywords
- GaN
- Green LED
- Moth-eye structure
- Nanoimprint lithography
- Photoluminescence
- Photon extraction efficiency
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering