Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography

Kyeong Jae Byeon, Seon Yong Hwang, Heon Lee

    Research output: Contribution to journalArticlepeer-review

    13 Citations (Scopus)

    Abstract

    A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region.

    Original languageEnglish
    Pages (from-to)830-833
    Number of pages4
    JournalMicroelectronic Engineering
    Volume85
    Issue number5-6
    DOIs
    Publication statusPublished - 2008 May

    Bibliographical note

    Funding Information:
    This study was supported by the basic research program of the Korea Science & Engineering Foundation (Grant No. R01-2006-000-10904-0) and a Grant from the Center for Nano-scale Mechatronics and Manufacturing, one of the 21st Century Frontier Research Programs, which are supported by the Ministry of Science and Technology, Korea.

    Keywords

    • Indium tin oxide (ITO)
    • Nanoimprint lithography (NIL)
    • Patterned transparent electrode
    • Photonic crystals
    • Transparent conducting oxide (TCO) layer

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Atomic and Molecular Physics, and Optics
    • Condensed Matter Physics
    • Surfaces, Coatings and Films
    • Electrical and Electronic Engineering

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