Abstract
A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region.
Original language | English |
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Pages (from-to) | 830-833 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 85 |
Issue number | 5-6 |
DOIs | |
Publication status | Published - 2008 May |
Bibliographical note
Funding Information:This study was supported by the basic research program of the Korea Science & Engineering Foundation (Grant No. R01-2006-000-10904-0) and a Grant from the Center for Nano-scale Mechatronics and Manufacturing, one of the 21st Century Frontier Research Programs, which are supported by the Ministry of Science and Technology, Korea.
Keywords
- Indium tin oxide (ITO)
- Nanoimprint lithography (NIL)
- Patterned transparent electrode
- Photonic crystals
- Transparent conducting oxide (TCO) layer
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering