@inproceedings{366e941f35654f579f83ae313de04dcf,
title = "Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography",
abstract = "UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.",
keywords = "Bi-layer imprinting, LOL {\texttrademark}2000, Lift-off, UV nano imprint lithography",
author = "Yang, \{Ki Yeon\} and Hong, \{Sung Hoon\} and Heon Lee and Choi, \{Jeong Woo\}",
year = "2006",
doi = "10.4028/0-87849-995-4.446",
language = "English",
isbn = "0878499954",
series = "Materials Science Forum",
publisher = "Trans Tech Publications Ltd",
pages = "446--449",
booktitle = "Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7",
note = "7th International Symposium on Eco-Materials Processing and Design, ISEPD-7 ; Conference date: 08-01-2006 Through 11-01-2006",
}