Fabrication of nanoporous noble metal thin films by O2 plasma dealloying

Geun Hyuk Lee, Sehoon An, Seong Woo Jang, Sehoon Hwang, Sang Ho Lim, Seunghee Han

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


In this study, 300 nm thick nanoporous (np) noble metal thin films containing mesopores (2–50 nm) or macropores (> 50 nm) were fabricated by O2 plasma dealloying of sputter-deposited noble metal-carbon thin films. Noble metal-carbon thin films of 500 nm thickness were deposited on Si wafer substrates, and the target power was controlled to obtain a proper compositional ratio. Subsequently, O2 plasma dealloying was performed to selectively remove carbon atoms, thereby forming the np structure. Using this method, we successfully fabricated various np thin films of noble metals, such as Au, Ag and Pt.

Original languageEnglish
Pages (from-to)147-151
Number of pages5
JournalThin Solid Films
Publication statusPublished - 2017 Jun 1

Bibliographical note

Funding Information:
This research was supported by the “Advanced architecturing for high-power photovoltaics (code no. 2E26510)” and “Development of high voltage pulse modulator for plasma immersion ion implantation (code no. 2MP0350)” programs of the Korea Institute of Science and Technology in the Republic of Korea.

Publisher Copyright:
© 2017 Elsevier B.V.


  • Dealloying
  • Oxygen plasma
  • Porous material
  • Sputtering
  • Surface diffusion
  • Thin films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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