Fabrication of nanosize patterned substrates using nano imprinting lithography

Heon Lee; Sunghoon Hong; Giyeon Yang

doi:10.1109/MMB.2005.1548437

Fabrication of nanosize patterned substrates using nano imprinting lithography

Heon Lee, Sunghoon Hong, Giyeon Yang

Department of Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)

Abstract

Three different kinds of imprinting lithography techniques UV curing imprinting, thermally curing imprinting with monomer resin, and hot embossing imprinting with polymer resin were used to transfer as small as 70nm patterns of template onto the various substrates including Si wafer, oxidized Si wafer, quartz wafer, glass plate, PET (Polyethylene Terephthalate) film, ITO (Indium Tin Oxide) coated PET, and Al foil. High fidelity pattern transferring was observed in all cases. It is shown that nano-imprinting lithography is one of the most promising techniques to fabricate nanosize patterns on various substrates.

Original language	English
Title of host publication	2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology
Pages	237-240
Number of pages	4
DOIs	https://doi.org/10.1109/MMB.2005.1548437
Publication status	Published - 2005
Event	2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology - Oahu, HI, United States Duration: 2005 May 12 → 2005 May 15

Publication series

Name	2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology
Volume	2005

Other

Other	2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology
Country/Territory	United States
City	Oahu, HI
Period	05/5/12 → 05/5/15

Keywords

Hot embossing nano-imprinting lithography
Nanopatterned substrate
Polyethylene terephthalate
Polymethylmethacrylate
Resin
Template
UV curing nanoimprinting lithography

ASJC Scopus subject areas

Engineering(all)

Access to Document

10.1109/MMB.2005.1548437

Cite this

Lee, H., Hong, S., & Yang, G. (2005). Fabrication of nanosize patterned substrates using nano imprinting lithography. In 2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology (pp. 237-240). [1548437] (2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology; Vol. 2005). https://doi.org/10.1109/MMB.2005.1548437

Fabrication of nanosize patterned substrates using nano imprinting lithography. / Lee, Heon; Hong, Sunghoon; Yang, Giyeon.
2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology. 2005. p. 237-240 1548437 (2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology; Vol. 2005).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Lee, H, Hong, S & Yang, G 2005, Fabrication of nanosize patterned substrates using nano imprinting lithography. in 2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology., 1548437, 2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology, vol. 2005, pp. 237-240, 2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology, Oahu, HI, United States, 05/5/12. https://doi.org/10.1109/MMB.2005.1548437

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title = "Fabrication of nanosize patterned substrates using nano imprinting lithography",

abstract = "Three different kinds of imprinting lithography techniques UV curing imprinting, thermally curing imprinting with monomer resin, and hot embossing imprinting with polymer resin were used to transfer as small as 70nm patterns of template onto the various substrates including Si wafer, oxidized Si wafer, quartz wafer, glass plate, PET (Polyethylene Terephthalate) film, ITO (Indium Tin Oxide) coated PET, and Al foil. High fidelity pattern transferring was observed in all cases. It is shown that nano-imprinting lithography is one of the most promising techniques to fabricate nanosize patterns on various substrates.",

keywords = "Hot embossing nano-imprinting lithography, Nanopatterned substrate, Polyethylene terephthalate, Polymethylmethacrylate, Resin, Template, UV curing nanoimprinting lithography",

author = "Heon Lee and Sunghoon Hong and Giyeon Yang",

year = "2005",

doi = "10.1109/MMB.2005.1548437",

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AB - Three different kinds of imprinting lithography techniques UV curing imprinting, thermally curing imprinting with monomer resin, and hot embossing imprinting with polymer resin were used to transfer as small as 70nm patterns of template onto the various substrates including Si wafer, oxidized Si wafer, quartz wafer, glass plate, PET (Polyethylene Terephthalate) film, ITO (Indium Tin Oxide) coated PET, and Al foil. High fidelity pattern transferring was observed in all cases. It is shown that nano-imprinting lithography is one of the most promising techniques to fabricate nanosize patterns on various substrates.

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Fabrication of nanosize patterned substrates using nano imprinting lithography

Abstract

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Keywords

ASJC Scopus subject areas

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