Fabrication of nanosize patterned substrates using nano imprinting lithography

Heon Lee, Sunghoon Hong, Giyeon Yang

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    3 Citations (Scopus)

    Abstract

    Three different kinds of imprinting lithography techniques UV curing imprinting, thermally curing imprinting with monomer resin, and hot embossing imprinting with polymer resin were used to transfer as small as 70nm patterns of template onto the various substrates including Si wafer, oxidized Si wafer, quartz wafer, glass plate, PET (Polyethylene Terephthalate) film, ITO (Indium Tin Oxide) coated PET, and Al foil. High fidelity pattern transferring was observed in all cases. It is shown that nano-imprinting lithography is one of the most promising techniques to fabricate nanosize patterns on various substrates.

    Original languageEnglish
    Title of host publication2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology
    Pages237-240
    Number of pages4
    DOIs
    Publication statusPublished - 2005
    Event2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology - Oahu, HI, United States
    Duration: 2005 May 122005 May 15

    Publication series

    Name2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology
    Volume2005

    Other

    Other2005 3rd IEEE/EMBS Special Topic Conference on Microtechnology in Medicine and Biology
    Country/TerritoryUnited States
    CityOahu, HI
    Period05/5/1205/5/15

    Keywords

    • Hot embossing nano-imprinting lithography
    • Nanopatterned substrate
    • Polyethylene terephthalate
    • Polymethylmethacrylate
    • Resin
    • Template
    • UV curing nanoimprinting lithography

    ASJC Scopus subject areas

    • General Engineering

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