TY - JOUR
T1 - Fabrication of nanosized antireflection patterns on surface of aspheric lens substrate by nanoimprint lithography
AU - Shin, Ju Hyeon
AU - Choi, Hak Jong
AU - Kim, Guy Tae
AU - Choi, Je Hong
AU - Lee, Heon
PY - 2013/5
Y1 - 2013/5
N2 - Currently, various techniques are being explored for fabricating nano- or microsized patterns on flat and curved substrates. However, there are only a few techniques that can be used to fabricate nano- to microsized patterns on the surface of aspheric lenses. In this study, nanoimprint lithography (NIL) was used to obtain nanosized antireflection structures on the surface of aspheric lenses. In order to ensure conformal contact between the imprint mould and the aspheric lens substrate, a highly flexible poly(urethane acrylate) (PUA)-based film mould was used. As a result, various nanosized patterns were uniformly fabricated on the surface of the aspheric lens with high fidelity.
AB - Currently, various techniques are being explored for fabricating nano- or microsized patterns on flat and curved substrates. However, there are only a few techniques that can be used to fabricate nano- to microsized patterns on the surface of aspheric lenses. In this study, nanoimprint lithography (NIL) was used to obtain nanosized antireflection structures on the surface of aspheric lenses. In order to ensure conformal contact between the imprint mould and the aspheric lens substrate, a highly flexible poly(urethane acrylate) (PUA)-based film mould was used. As a result, various nanosized patterns were uniformly fabricated on the surface of the aspheric lens with high fidelity.
UR - http://www.scopus.com/inward/record.url?scp=84880865855&partnerID=8YFLogxK
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U2 - 10.7567/APEX.6.055001
DO - 10.7567/APEX.6.055001
M3 - Article
AN - SCOPUS:84880865855
SN - 1882-0778
VL - 6
JO - Applied Physics Express
JF - Applied Physics Express
IS - 5
M1 - 055001
ER -