Fabrication of silica nanostructures with a microwave assisted direct patterning process

Ju Hyeon Shin, Bit Na Go, Je Hong Choi, Jin Seoung Kim, Gun Young Jung, Heetae Kim, Heon Lee

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro-to nano-sized structures, including moth-eye patterns of SiO which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, motheye and 50 nm sized line/space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out.

Original languageEnglish
Article number225301
Issue number22
Publication statusPublished - 2014


  • Microwave assisted direct patterning
  • Microwave heating
  • Moth-eye pattern
  • PDMS mold
  • SiO nano-particle dispersed solution
  • Soft lithography

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering


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