Fabrication of silica nanostructures with a microwave assisted direct patterning process

Ju Hyeon Shin; Bit Na Go; Je Hong Choi; Jin Seoung Kim; Gun Young Jung; Heetae Kim; Heon Lee

doi:10.1088/0957-4484/25/22/225301

Fabrication of silica nanostructures with a microwave assisted direct patterning process

Ju Hyeon Shin, Bit Na Go, Je Hong Choi, Jin Seoung Kim, Gun Young Jung, Heetae Kim, Heon Lee

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro-to nano-sized structures, including moth-eye patterns of SiO which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO₂ nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, motheye and 50 nm sized line/space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO₂ thin films with and without microwave heating was also carried out.

Original language	English
Article number	225301
Journal	Nanotechnology
Volume	25
Issue number	22
DOIs	https://doi.org/10.1088/0957-4484/25/22/225301
Publication status	Published - 2014

Bibliographical note

Funding Information:
This research was supported by NanoMaterial Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2012M3A7B4035323). This research was also conducted by International Collaborative Research and Development Program and funded by Ministry of Trade, Industry & Energy.

Funding Information:
This research was supported by Nano·Material Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2012M3A7B4035323). This research was also conducted by International Collaborative Research and Development Program and funded by Ministry of Trade, Industry & Energy.

Publisher Copyright:
© 2014 IOP Publishing Ltd Printed in the UK.

Keywords

Microwave assisted direct patterning
Microwave heating
Moth-eye pattern
PDMS mold
SiO nano-particle dispersed solution
Soft lithography

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

Access to Document

10.1088/0957-4484/25/22/225301

Cite this

@article{640270b961234f988ea4d2872564a68f,

title = "Fabrication of silica nanostructures with a microwave assisted direct patterning process",

abstract = "Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro-to nano-sized structures, including moth-eye patterns of SiO which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, motheye and 50 nm sized line/space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out.",

keywords = "Microwave assisted direct patterning, Microwave heating, Moth-eye pattern, PDMS mold, SiO nano-particle dispersed solution, Soft lithography",

author = "Shin, {Ju Hyeon} and Go, {Bit Na} and Choi, {Je Hong} and Kim, {Jin Seoung} and Jung, {Gun Young} and Heetae Kim and Heon Lee",

note = "Funding Information: This research was supported by NanoMaterial Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2012M3A7B4035323). This research was also conducted by International Collaborative Research and Development Program and funded by Ministry of Trade, Industry & Energy. Funding Information: This research was supported by Nano·Material Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2012M3A7B4035323). This research was also conducted by International Collaborative Research and Development Program and funded by Ministry of Trade, Industry & Energy. Publisher Copyright: {\textcopyright} 2014 IOP Publishing Ltd Printed in the UK.",

year = "2014",

doi = "10.1088/0957-4484/25/22/225301",

language = "English",

volume = "25",

journal = "Nanotechnology",

issn = "0957-4484",

publisher = "IOP Publishing Ltd.",

number = "22",

}

TY - JOUR

T1 - Fabrication of silica nanostructures with a microwave assisted direct patterning process

AU - Shin, Ju Hyeon

AU - Go, Bit Na

AU - Choi, Je Hong

AU - Kim, Jin Seoung

AU - Jung, Gun Young

AU - Kim, Heetae

AU - Lee, Heon

N1 - Funding Information: This research was supported by NanoMaterial Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2012M3A7B4035323). This research was also conducted by International Collaborative Research and Development Program and funded by Ministry of Trade, Industry & Energy. Funding Information: This research was supported by Nano·Material Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2012M3A7B4035323). This research was also conducted by International Collaborative Research and Development Program and funded by Ministry of Trade, Industry & Energy. Publisher Copyright: © 2014 IOP Publishing Ltd Printed in the UK.

PY - 2014

Y1 - 2014

N2 - Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro-to nano-sized structures, including moth-eye patterns of SiO which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, motheye and 50 nm sized line/space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out.

AB - Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro-to nano-sized structures, including moth-eye patterns of SiO which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, motheye and 50 nm sized line/space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out.

KW - Microwave assisted direct patterning

KW - Microwave heating

KW - Moth-eye pattern

KW - PDMS mold

KW - SiO nano-particle dispersed solution

KW - Soft lithography

UR - http://www.scopus.com/inward/record.url?scp=84947712492&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/25/22/225301

DO - 10.1088/0957-4484/25/22/225301

M3 - Article

AN - SCOPUS:84947712492

SN - 0957-4484

VL - 25

JO - Nanotechnology

JF - Nanotechnology

IS - 22

M1 - 225301

ER -

Fabrication of silica nanostructures with a microwave assisted direct patterning process

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this