Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp

Sung Hoon Hong; Kang Soo Han; Kyeong Jae Byeon; Heon Lee; Kyung Woo Choi

doi:10.1143/JJAP.47.3699

Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp

Sung Hoon Hong, Kang Soo Han, Kyeong Jae Byeon, Heon Lee, Kyung Woo Choi

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.

Original language	English
Pages (from-to)	3699-3701
Number of pages	3
Journal	Japanese journal of applied physics
Volume	47
Issue number	5 PART 1
DOIs	https://doi.org/10.1143/JJAP.47.3699
Publication status	Published - 2008 May 16

Keywords

Curved substrate
Flexible stamp
Hot embossing
Nanoimprint
Nickel foil stamp

ASJC Scopus subject areas

General Engineering
General Physics and Astronomy

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10.1143/JJAP.47.3699

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title = "Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp",

abstract = "As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.",

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AU - Hong, Sung Hoon

AU - Han, Kang Soo

AU - Byeon, Kyeong Jae

AU - Lee, Heon

AU - Choi, Kyung Woo

PY - 2008/5/16

Y1 - 2008/5/16

N2 - As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.

AB - As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.

KW - Curved substrate

KW - Flexible stamp

KW - Hot embossing

KW - Nanoimprint

KW - Nickel foil stamp

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Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp

Abstract

Keywords

ASJC Scopus subject areas

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