Fabrication of suspended bridge type resonator using laser interference lithography

Boyeon Hwang, In Sang Song, Jung Ho Park, Jea Shik Shin, Jae Sung Rieh, Sung Woo Hwang, Byeong Kwon Ju

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report the fabrication method of suspended bridge type nanoelectromechanical system (NEMS) resonator for high quality factor (Q-factor) and increase in resonance frequency beyond the ultra-high frequency (UHF) by laser interference lithography (LIL) using silicon-on-insulator wafer. LIL is capable of a fast nano-patterning over a large area and does not require a mask. In fabricating a suspended bridge type structure, parameter effects such as exposure dosage and the half angle between two incident beams at the intersection were explored. In this paper, successful fabrication of suspended bridge type NEMS resonator is presented using 257nm wavelength laser LIL.

Original languageEnglish
Title of host publicationEuropean Microwave Week 2012
Subtitle of host publication"Space for Microwaves", EuMW 2012, Conference Proceedings - 7th European Microwave Integrated Circuits Conference, EuMIC 2012
Pages524-527
Number of pages4
Publication statusPublished - 2012
Event7th European Microwave Integrated Circuits Conference, EuMIC 2012 - Held as Part of 15th European Microwave Week, EuMW 2012 - Amsterdam, Netherlands
Duration: 2012 Oct 292012 Oct 30

Publication series

NameEuropean Microwave Week 2012: "Space for Microwaves", EuMW 2012, Conference Proceedings - 7th European Microwave Integrated Circuits Conference, EuMIC 2012

Other

Other7th European Microwave Integrated Circuits Conference, EuMIC 2012 - Held as Part of 15th European Microwave Week, EuMW 2012
Country/TerritoryNetherlands
CityAmsterdam
Period12/10/2912/10/30

Keywords

  • Laser Interference Lithography
  • NEMS
  • Resonator

ASJC Scopus subject areas

  • Hardware and Architecture

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