Keyphrases
Rutile
100%
Ultraviolet Nanoimprint Lithography (UV-NIL)
100%
Microscale Structure
100%
Resin
66%
TiO2 Nanoparticles
66%
Optical Properties
33%
Nanoparticle Concentration
33%
Refractive Index
33%
High-throughput
33%
Flexible Substrate
33%
Si Wafer
33%
High Aspect Ratio
33%
UV-Vis Spectrophotometry
33%
Microscale Pattern
33%
Low Aspect Ratio
33%
Area Throughput
33%
Engineering
Nanoparticle
100%
Microscale
100%
UV Nanoimprint Lithography
100%
Flexible Substrate
33%
Si Wafer
33%
High Aspect Ratio
33%
Monomer
33%
Nanoimprint Lithography
33%
Refractive Index
33%
Aspect Ratio
33%
Refractivity
33%
Material Science
Lithography
100%
Titanium Dioxide
100%
Nanoparticle
75%
Optical Property
25%
Refractive Index
25%
Chemical Engineering
Lithography
100%
Titanium Dioxide
100%
Nanoparticle
75%
Spectrophotometry
25%