Facile and precise fabrication of 10-nm nanostructures on soft and hard substrates

Ju Yeon Woo, Sunghwan Jo, Jun Ho Oh, Ju Tae Kim, Chang Soo Han

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)


One of the major challenges in the field of nanotechnology is the facile and inexpensive fabrication of <10-nm nanostructures with a defect-free and precise pattern over a large area. Nanoimprint lithography (NIL) is a nanopatterning method that allows low-cost, fast production, and large-scale fabrication, but it needs improvement with regard to achieving a high resolution over a large area, processing on soft substrates, and nanomaterial patterning. Herein, it is demonstrated 10-nm patterning on soft and hard substrates via an advanced nanoimprint process. With a 100-nm master mold, both soft and hard molds with reduced pattern sizes (50, 20, 10, and 5 nm) are first fabricated using atomic layer deposition (ALD) of Al2O3. After surface functionalization of the mold, nanoscale patterns are imprinted on both hard (Si) and soft polyethylene terephthalate substrates, which result in structures with a pattern size of 10 nm. Using a hybrid supporting layer poly(methyl methacrylate) (PMMA)/poly(vinyl alcohol) (PVA) and ion sputter etching, a well-defined and clean sub-10 nm nanostructure is achieved for the nanomaterial on the substrate after lift-off and thermal annealing processes. Using this method, a graphene nanoribbon 10 nm wide is fabricated. Our approach is suitable for the fabrication of devices and structures with a 10-nm-scale pattern over a large area.

Original languageEnglish
Pages (from-to)317-325
Number of pages9
JournalApplied Surface Science
Publication statusPublished - 2019 Aug 1

Bibliographical note

Funding Information:
This work was supported by the Basic Science Research Program (Grant Nos. 2018R1A2A1A05023556 and 2018R1D1A1B07047119 ) and partially by the Center for Advanced Soft Electronics through the National Research Foundation funded by the Ministry of Science and ICT and Korea University Grant, Korea.

Publisher Copyright:
© 2019 Elsevier B.V.


  • Atomic layer deposition
  • Ion sputter etching
  • Mold
  • Nanofabrication
  • Nanoimprint lithography

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces


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