Fatigue behaviors of silicon nanowire field-effect transistors on bendable substrate

Yoonjoong Kim, Youngin Jeon, Doohyeok Lim, Sangsig Kim

    Research output: Contribution to journalArticlepeer-review

    3 Citations (Scopus)

    Abstract

    In this study, we fabricated an island-structured silicon nanowire (SiNW) field-effect transistor (FET) on an Ecoflex substrate and analyzed the device reliability against the bending fatigue. A SiNW-FET was fabricated on a plastic substrate and this FET on the plastic substrate was transferred onto the Ecoflex substrate. Compared to a SiNW-FET on a plastic substrate, the SiNW-FET with the island plastic structure on the Ecoflex substrate showed the stable electrical characteristics under various bending strain. Variations less than 10% of the threshold voltage and transconductance were observed under the bending strain of 15%. Moreover, the electrical characteristics were maintained even after 2000 bending cycles.

    Original languageEnglish
    Pages (from-to)12823-12826
    Number of pages4
    JournalJournal of Nanoscience and Nanotechnology
    Volume16
    Issue number12
    DOIs
    Publication statusPublished - 2016 Dec 1

    Bibliographical note

    Funding Information:
    This work was partly supported by the National Research Foundation of Korea (NRF) Grant funded by the Korean Government (MSIP) (Nos. NRF-2013R1A2A1A03070750 and NRF-2015R1A2A1A15055437), the Brain Korea 21 Plus Project in 2015 and Samsung Electronics.

    Publisher Copyright:
    Copyright © 2016 American Scientific Publishers All rights reserved.

    Copyright:
    Copyright 2018 Elsevier B.V., All rights reserved.

    Keywords

    • Ecoflex substrate
    • Field-effect transistor
    • Island structure
    • Silicon-nanowire

    ASJC Scopus subject areas

    • Bioengineering
    • General Chemistry
    • Biomedical Engineering
    • General Materials Science
    • Condensed Matter Physics

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