Abstract
The spin-on hard mask material for photo resist in semiconductor industry is usually obtained from a small-scale batch process. To obtain high purity products requires multiple-step purification processes, during which a large amount of organic solvent waste is emitted. In this study, a process for regenerating high purity solvent was proposed and the economic efficiency of the proposed process was analyzed. Also, a sensitivity analysis was performed to analyze the changing economics regarding the main variables. From the analysis, the break-even point can be achieved within one year for different cases considered. On the basis of 4-year operation, the profit margins for each case were determined and compared. It is concluded that the waste solvent regeneration process for spin-on hard mask material production in semiconductor industry is feasible and recommended.
| Original language | English |
|---|---|
| Pages (from-to) | 2375-2383 |
| Number of pages | 9 |
| Journal | Korean Journal of Chemical Engineering |
| Volume | 32 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - 2015 Dec 1 |
Bibliographical note
Publisher Copyright:© 2015, Korean Institute of Chemical Engineers, Seoul, Korea.
Keywords
- Economic Analysis
- Regeneration
- Sensitivity Analysis
- Spin-on Hard Mask Material
ASJC Scopus subject areas
- General Chemistry
- General Chemical Engineering