Flow lithography in gas impermeable channels

K. W. Bong, J. J. Xu, J. H. Kim, S. C. Chapin, M. S. Strano, K. K. Gleason, P. S. Doyle

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Flow lithography is a powerful synthesis tool that enables the creation of microparticles with complex morphologies and chemical patterns. In current flow lithography, PDMS (polydimethylsiloxane) flow channels are necessary because the process requires local inhibition of polymerization near channel interfaces via oxygen permeation through the PDMS. This current requirement places restrictions on both device construction and the use of solvents and/or monomers which do not swell the PDMS. Here, we present flow lithography that utilizes hydrodynamically focused inert fluids in oxygen impermeable channels made from NOA (Norland Optical Adhesive) channels. The new process greatly expands the compatible monomer and solvents, allows for on-the-fly height particle adjustment and allows for use of more durable channel materials.

Original languageEnglish
Title of host publication15th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2011, MicroTAS 2011
Pages1573-1575
Number of pages3
Publication statusPublished - 2011
Externally publishedYes
Event15th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2011, MicroTAS 2011 - Seattle, WA, United States
Duration: 2011 Oct 22011 Oct 6

Publication series

Name15th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2011, MicroTAS 2011
Volume3

Other

Other15th International Conference on Miniaturized Systems for Chemistry and Life Sciences 2011, MicroTAS 2011
Country/TerritoryUnited States
CitySeattle, WA
Period11/10/211/10/6

Keywords

  • Flow focusing
  • Flow lithography
  • NOA
  • Solvent

ASJC Scopus subject areas

  • Control and Systems Engineering

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