Abstract
The undoped and fluorine doped gallium tin oxide composite films are prepared by an electron cyclotron resonance metal organic chemical vapor deposition. Characteristics of structural, optical and electrical properties of the fluorine doped gallium tin oxide composite thin films are investigated. The four point probe method, atomic force microscopy and X-ray photoelectron spectroscopy are employed to characterize the composite thin films. UV-visible, X-ray diffraction, scanning electron microscope and Hall measurement performed on fluorine doped gallium tin oxide composite are films deposited on polyethylene terephthalate substrates. The diffraction pattern shows the presence of tetragonal structure with (112) special orientation for fluorine doped gallium tin oxide composite films. The doped composite film on F/Ga + Sn mole ratio of 0.35 is observed the lowest electrical resistivity of 3.35 × 10- 4 Ω cm.
| Original language | English |
|---|---|
| Pages (from-to) | 6863-6867 |
| Number of pages | 5 |
| Journal | Thin Solid Films |
| Volume | 519 |
| Issue number | 20 |
| DOIs | |
| Publication status | Published - 2011 Aug 1 |
Keywords
- Composite film
- ECR-CVD
- Electrical and optical properties
- Texture coefficient
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry