Keyphrases
Rapid Thermal Annealing
100%
Disilicide
100%
Annealing
80%
Amorphous Si
80%
Si Layer
60%
Transmission Electron Microscopy
40%
Photoemission Spectroscopy
40%
Solid Phase Epitaxial Regrowth
40%
High Temperature
20%
Crystallization
20%
Possible Mechanisms
20%
Secondary Ion Mass Spectrometry
20%
Silicide
20%
Growth Behavior
20%
Si Surface
20%
Amorphous Crystallization
20%
Annealing Treatment
20%
Nucleation Behavior
20%
Randomly Oriented
20%
Ripening Behavior
20%
Silicide Phase
20%
Stepwise Annealing
20%
Amorphous Precipitates
20%
Two-step Annealing
20%
Material Science
Annealing
100%
Transmission Electron Microscopy
40%
Epitaxy
40%
Silicide
40%
Photoemission Spectroscopy
40%
Surface (Surface Science)
40%
Nucleation
20%
Secondary Ion Mass Spectrometry
20%