Abstract
A TiO2 nano-structure was formed on the indium-tin-oxide electrode of a GaN-based light-emitting diode (LED) in order to enhance the light extraction efficiency. The UV bi-layer imprinting and lift-off processes were used to form the TiO2 nano-structure without any plasma etching process, which can lead to degradation of the electrical properties of the device. As a result, the light output power of the LED on the patterned sapphire substrate (PSS) with the TiO2 nano-structure was enhanced up to 12% compared to identical LED formed on the PSS without TiO2 nano-structure. No electrical degradation was observed for the patterned LED device.
| Original language | English |
|---|---|
| Pages (from-to) | 1021031-1021034 |
| Number of pages | 4 |
| Journal | Japanese journal of applied physics |
| Volume | 49 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 2010 Oct |
ASJC Scopus subject areas
- General Engineering
- General Physics and Astronomy
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