Functional microscopy tip fabrication by an electric conductive nanowire

Joondong Kim; Ju Hyung Yun; Moon Seop Hyun; Young Hyun Shin; Yun Chang Park; Ji Hye Lee; Sohee Jeong; Chang Soo Han

doi:10.1166/jnn.2010.2267

Functional microscopy tip fabrication by an electric conductive nanowire

Joondong Kim, Ju Hyung Yun, Moon Seop Hyun, Young Hyun Shin, Yun Chang Park, Ji Hye Lee, Sohee Jeong, Chang Soo Han

Research output: Contribution to journal › Article › peer-review

Abstract

The functional microscopy tip was fabricated by an electric conductive nanowire (NW). Single crystalline nickel suicide (NiSi) NW grown by plasma-enhanced chemical vapor deposition has an excellent electrical conductivity. On behalf of the advantages in tiny size and conductivity of NiSi NW, it was utilized as a nanoscale probe. Dielectrophoretic method was applied to position the NW. The NiSi NW containing solution was dropped in an ac electric field applying system to align the NiSi NW on a Si cantilever. The fabricated NiSi NW-sitting functional microscopy tip obtained the information of topography and electrical signals from a nanoscale structure. It shows the high potential of nanoscale microscopy tip fabrication at reduced processing steps.

Original language	English
Pages (from-to)	3207-3210
Number of pages	4
Journal	Journal of Nanoscience and Nanotechnology
Volume	10
Issue number	5
DOIs	https://doi.org/10.1166/jnn.2010.2267
Publication status	Published - 2010 May
Externally published	Yes

Keywords

Dielectrophoresis (DEP)
Functional microscopy tip
Nanoscale information
Nickel silicide nanowire (NiSi NW)
Plasma enhanced chemical vapor deposition (PECVD)

ASJC Scopus subject areas

Bioengineering
General Chemistry
Biomedical Engineering
General Materials Science
Condensed Matter Physics

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1166/jnn.2010.2267

Cite this

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title = "Functional microscopy tip fabrication by an electric conductive nanowire",

abstract = "The functional microscopy tip was fabricated by an electric conductive nanowire (NW). Single crystalline nickel suicide (NiSi) NW grown by plasma-enhanced chemical vapor deposition has an excellent electrical conductivity. On behalf of the advantages in tiny size and conductivity of NiSi NW, it was utilized as a nanoscale probe. Dielectrophoretic method was applied to position the NW. The NiSi NW containing solution was dropped in an ac electric field applying system to align the NiSi NW on a Si cantilever. The fabricated NiSi NW-sitting functional microscopy tip obtained the information of topography and electrical signals from a nanoscale structure. It shows the high potential of nanoscale microscopy tip fabrication at reduced processing steps.",

keywords = "Dielectrophoresis (DEP), Functional microscopy tip, Nanoscale information, Nickel silicide nanowire (NiSi NW), Plasma enhanced chemical vapor deposition (PECVD)",

author = "Joondong Kim and Yun, {Ju Hyung} and Hyun, {Moon Seop} and Shin, {Young Hyun} and Park, {Yun Chang} and Lee, {Ji Hye} and Sohee Jeong and Han, {Chang Soo}",

year = "2010",

month = may,

doi = "10.1166/jnn.2010.2267",

language = "English",

volume = "10",

pages = "3207--3210",

journal = "Journal of Nanoscience and Nanotechnology",

issn = "1533-4880",

publisher = "American Scientific Publishers",

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TY - JOUR

T1 - Functional microscopy tip fabrication by an electric conductive nanowire

AU - Kim, Joondong

AU - Yun, Ju Hyung

AU - Hyun, Moon Seop

AU - Shin, Young Hyun

AU - Park, Yun Chang

AU - Lee, Ji Hye

AU - Jeong, Sohee

AU - Han, Chang Soo

PY - 2010/5

Y1 - 2010/5

N2 - The functional microscopy tip was fabricated by an electric conductive nanowire (NW). Single crystalline nickel suicide (NiSi) NW grown by plasma-enhanced chemical vapor deposition has an excellent electrical conductivity. On behalf of the advantages in tiny size and conductivity of NiSi NW, it was utilized as a nanoscale probe. Dielectrophoretic method was applied to position the NW. The NiSi NW containing solution was dropped in an ac electric field applying system to align the NiSi NW on a Si cantilever. The fabricated NiSi NW-sitting functional microscopy tip obtained the information of topography and electrical signals from a nanoscale structure. It shows the high potential of nanoscale microscopy tip fabrication at reduced processing steps.

AB - The functional microscopy tip was fabricated by an electric conductive nanowire (NW). Single crystalline nickel suicide (NiSi) NW grown by plasma-enhanced chemical vapor deposition has an excellent electrical conductivity. On behalf of the advantages in tiny size and conductivity of NiSi NW, it was utilized as a nanoscale probe. Dielectrophoretic method was applied to position the NW. The NiSi NW containing solution was dropped in an ac electric field applying system to align the NiSi NW on a Si cantilever. The fabricated NiSi NW-sitting functional microscopy tip obtained the information of topography and electrical signals from a nanoscale structure. It shows the high potential of nanoscale microscopy tip fabrication at reduced processing steps.

KW - Dielectrophoresis (DEP)

KW - Functional microscopy tip

KW - Nanoscale information

KW - Nickel silicide nanowire (NiSi NW)

KW - Plasma enhanced chemical vapor deposition (PECVD)

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U2 - 10.1166/jnn.2010.2267

DO - 10.1166/jnn.2010.2267

M3 - Article

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SN - 1533-4880

VL - 10

SP - 3207

EP - 3210

JO - Journal of Nanoscience and Nanotechnology

JF - Journal of Nanoscience and Nanotechnology

IS - 5

ER -

Functional microscopy tip fabrication by an electric conductive nanowire

Abstract

Keywords

ASJC Scopus subject areas

UN SDGs

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